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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Improved Gate Oxide Reliability by Repeated N20 Rapid Thermal Annealings
Details
Improved Gate Oxide Reliability by Repeated N20 Rapid Thermal Annealings
Date Issued
1993
Date
1993
Author(s)
Hwu, Jenn-Gwo
URI
http://ntur.lib.ntu.edu.tw//handle/246246/153910
Type
report