https://scholars.lib.ntu.edu.tw/handle/123456789/153860| Title: | Improved Gate Oxide Reliability by Repeated N20 Rapid Thermal Annealings | Authors: | 胡振國 Wu, Y. L. Hwu, Jenn-Gwo Wu, Y. L. |
Issue Date: | 1993 | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/153910 |
| Appears in Collections: | 電機工程學系 |
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