Effect of a deprotection group on acrylic photoresist
Resource
Journal of Polymer Research 6 (2): 99-105
Journal
Journal of Polymer Research
Journal Volume
6
Journal Issue
2
Pages
99-105
Date Issued
1999
Date
1999
Author(s)
Abstract
This study is synthesized and investigated polyacrylate single layer resist (SLR) using t-amyl alcohol as a deprotection group. The t-amyl group of the copolymer resist and dissolution inhibitor (DI) in this chemically amplified photoresist (CAMP) was deprotected by a light stimulated photoacid generator (PAG) upon post exposure bake (PEB). The polarity change of the system from a hydrophobic to a hydrophilic property made the exposed region soluble in the base developer. KrF and ArF excimer lasers were used to test resists using two components (PR and PAG) and three components (PR, DI and PAG) in the resists. This study also investigated the different effects of exposure dose, developer concentration, and content between t-amyl and t-butyl methacrylate on lithographic performance of resists.
Other Subjects
Alcohols; Copolymers; Excimer lasers; Hydrophobicity; Photoresists; Polarization; Polyacrylates; Chemically amplified photoresists (CAMP); Dissolution inhibitors (DI); Photoacid generators (PAG); Post exposure bake (PEB); Single layer resists (SLR); Plastic coatings
Type
journal article
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