前瞻矽鍺/高介電質/金屬閘極元件及模組技術 – 子計 畫四：矽鍺/高介電質/金屬閘極光電元件與模組技術(I)

Abstract

光電產業被認為是下一個具有發展潛力的 明星產業。目前全球光電元件的產值約佔整 個半導體產業的6 % (10 B 美金)，並且其比 重會隨著時間繼續增加。以2002 年為例， 台灣光電產業產值即高達3000 億新台幣， 其中光電顯示器及光儲存產品佔大多數，而 光通訊用元件及發光、光偵測元件則相對較 少。而在這些光電產品中，矽基元件多用在 CMOS image sensor（數位照相用），liquid crystal on Si（顯示器用），及array waveguide grating( 光通訊用) 上。因此若是能利用 CMOS 產業所發展的技術來製造光電元 件，增加矽的功能（有人稱為“silicon+”）， 即是研究CMOS optoelectronics的目的。本研 究即希望能利用先進的矽鍺、high k 及 metal gate 技術並結合其他子計畫來製成新 型量子光電元件及高頻光通訊用零組件。

The optoelectronics industry is a star industry with potential. The value of output in optoelectronics devices is about 6 percentage (10 B US dollar) of total semiconductor industry, and it will be increased with time. For example, the value of output in optoelectronics industry in Taiwan is 3000 hundred million, which is almost contributed by display and storage. The optical communication, emitting, optical detection device have few contribution to the value of output in optoelectronics industry. In the past, the COMS image sensor (for digital camera), liquid crystal on Si (for display), and the array waveguide grating (for optical communication) are all Si base device. So that it is the purpose for researching COMS optoelectronics to enhance the function of Si (called “silicon+”) if the optoelectronics device can be made of COMS technology. The combination of advance SiGe, high k, and metal gate for novel quantum optoelectronics device and high frequency optical communication is purpose in this research.