增強照射均勻度的快熱製程機台反射體之製作與可靠度測試

Abstract

傳統半導體製程使用之加熱爐由於升溫及降溫速度慢，所以製程時間長。快速熱製程 機台升溫及降溫速度快，可以大幅縮短製程時間。快速熱製程機台內的反射體對於溫度均 勻度有相當大的影響，反射體為消耗品，有其使用壽命。我們自行計算模擬並進行製程測 試實驗，製作出SD 標準差較佳之快速熱製程新型多平面反射體，受限於反射體內部需預留 水路，僅可製作出約1.5cm 之平面差距，使得補償差別未能有效顯示出來。

Traditional furnace has long processing time, because of slow rate in rising or lowering temperature. RTP（Rapid thermal Process） can shorten much processing time, due to fast temperature-rising or temperature-lowering rate. The reflector in RTP has a lot of influence on temperature uniformity. Reflector is expendable and has some lifetime. We ourselves have simulated and experimented. We can make reflector which quality is as good as made by Jet.