https://scholars.lib.ntu.edu.tw/handle/123456789/174208| Title: | 先進CMOS元件及製程研究－子計畫一：適用於低溫基板製程之高品質絕緣膜形成技術(2/3) | Authors: | 胡振國 | Issue Date: | 31-Jul-2008 | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/78802 | Rights: | 國立臺灣大學電子工程學研究所 |
| Appears in Collections: | 電子工程學研究所 |
| File | Description | Size | Format | |
|---|---|---|---|---|
| 952221E002358.pdf | 244.87 kB | Adobe PDF | View/Open |
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