Photolithographic Hole-Transport Layer Derived from Electrochemical Deposition of Oligo(5-vinyl-2-nitrobenzyl triphenylamine-4-carboxylate)
Resource
Chemistry of Materials 20 (18): 5816-5821
Journal
Chemistry of Materials
Pages
5816-5821
Date Issued
2008
Date
2008
Author(s)
Chang, Chin-Chuan
Abstract
Electrochemically deposited layer (EDL) prepared from electropolymerization of oligo(5-vinyl-2-nitrobenzyl triphenylamine-4-carboxylate) on conductive indium tin oxide glass (ITO) showed photolithographic properties as well as good hole-injection and transport properties. Under the optimized conditions, the polymeric light-emitting device (PLED) of ITO/EDL/polyvinylcarbazole(PVK)-Ir(PPy)3-[2-biphenylyl-5-(4′-tert-butylphenyl)oxadiazole] (PBD)/Mg−Ag had a turn-on voltage of 13.5 V (100 cd/m2) with a maximum brightness of 9100 cd/m2, and the current efficiency of 10.3 cd/A. When the EDL was exposed to UV light (365 nm) through a patterned photomask and developed in CH2Cl2, a positive image was obtained. After irradiation for 8 min through a band-pass filter (17 mW/cm2) by a Xeon lamp, the EDL became soluble and could be depleted completely in CH2Cl2. Patterned PLED device was also fabricated by this technique.
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Type
journal article
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