https://scholars.lib.ntu.edu.tw/handle/123456789/288947
Title: | Enhancement in soft breakdown occurrence of ultra-thin gate oxides caused by photon effect in rapid thermal post-oxidation annealing | Authors: | JENN-GWO HWU | Issue Date: | 2000 | Journal Volume: | 44 | Journal Issue: | 8 | Start page/Pages: | 1405-1410 | Source: | Solid-State Electronics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0033723854&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/288947 |
DOI: | 10.1016/S0038-1101(00)00100-3 |
Appears in Collections: | 電機工程學系 |
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