https://scholars.lib.ntu.edu.tw/handle/123456789/288948
Title: | Thin-oxide thickness measurement in ellipsometry by a wafer rotation method | Authors: | JENN-GWO HWU | Issue Date: | 1990 | Journal Volume: | 33 | Journal Issue: | 10 | Start page/Pages: | 1327-1328 | Source: | Solid State Electronics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0025502702&partnerID=MN8TOARS https://www.scopus.com/inward/record.uri?eid=2-s2.0-0025502702&doi=10.1016%2f0038-1101%2890%2990037-F&partnerID=40&md5=7e20a32d2b07368a5f6d77c5cd856e9d |
DOI: | 10.1016/0038-1101(90)90037-F | SDG/Keyword: | Ellipsometry; Thin-Oxide Thickness Measurement; Wafer Rotation Method; Oxides |
Appears in Collections: | 電機工程學系 |
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