https://scholars.lib.ntu.edu.tw/handle/123456789/292414| Title: | Stress effect on the kinetics of silicon thermal oxidation | Authors: | Yen, J.-Y. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2001 | Journal Volume: | 89 | Journal Issue: | 5 | Start page/Pages: | 3027-3032 | Source: | Journal of Applied Physics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0000376377&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/292414 |
DOI: | 10.1063/1.1342801 |
| Appears in Collections: | 電機工程學系 |
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