Improvement in oxide thickness uniformity by repeated spike oxidation

Journal

IEEE Transactions on Semiconductor Manufacturing

Journal Volume

14

Journal Issue

3

Pages

227-230

Date Issued

2001

Author(s)

Hong, C.-C.

Lee, C.-Y.

Hsieh, Y.-L.

Liu, C.-C.

Fong, I.-K.

Hwu, J.-G.

DOI

10.1109/66.939819

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0035423123&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/292415

Type

journal article