https://scholars.lib.ntu.edu.tw/handle/123456789/292415| Title: | Improvement in oxide thickness uniformity by repeated spike oxidation | Authors: | Hong, C.-C. Lee, C.-Y. Hsieh, Y.-L. Liu, C.-C. Fong, I.-K. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2001 | Journal Volume: | 14 | Journal Issue: | 3 | Start page/Pages: | 227-230 | Source: | IEEE Transactions on Semiconductor Manufacturing | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0035423123&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/292415 |
DOI: | 10.1109/66.939819 |
| Appears in Collections: | 電機工程學系 |
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