https://scholars.lib.ntu.edu.tw/handle/123456789/292804| Title: | Organometallic ruthenium source reagents for CVD | Authors: | Lee, F.-J. Chi, Y. Liu, C.-S. Hsu, P.F. Chou, T.-Y. Peng, S.-M. Lee, G.-H. SHIE-MING PENG |
Issue Date: | 2001 | Journal Volume: | 7 | Journal Issue: | 3 | Start page/Pages: | 99-101 | Source: | Chemical Vapor Deposition | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0002598478&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/292804 |
DOI: | 10.1002/1521-3862(200105)7:3<99 |
| Appears in Collections: | 化學系 |
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