Organometallic ruthenium source reagents for CVD

Journal

Chemical Vapor Deposition

Journal Volume

7

Journal Issue

3

Pages

99-101

Date Issued

2001

Author(s)

Lee, F.-J.

Chi, Y.

Liu, C.-S.

Hsu, P.F.

Chou, T.-Y.

Lee, G.-H.

DOI

10.1002/1521-3862(200105)7:3<99

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0002598478&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/292804

Type

journal article