https://scholars.lib.ntu.edu.tw/handle/123456789/294534
Title: | Feasibility Study of Utilizing HMDSO Film as Bottom Antireflective Coating for 157 nm Lithography | Authors: | C.H. Lin L. A. Wang LON A. WANG |
Issue Date: | Jan-2001 | Start page/Pages: | 372-373 | Source: | 45th EIPBN | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/294534 |
Appears in Collections: | 光電工程學研究所 |
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