https://scholars.lib.ntu.edu.tw/handle/123456789/296936
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Hong, C.-C. | en_US |
dc.contributor.author | Chen, J.-L. | en_US |
dc.contributor.author | JENN-GWO HWU | en_US |
dc.creator | Hong, C.-C.;Chen, J.-L.;Hwu, J.-G. | - |
dc.date.accessioned | 2018-09-10T04:08:54Z | - |
dc.date.available | 2018-09-10T04:08:54Z | - |
dc.date.issued | 2002 | - |
dc.identifier.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0036494479&doi=10.1116%2f1.1453455&partnerID=40&md5=05f4425de429551b3ffe03208ff29b30 | - |
dc.identifier.uri | http://scholars.lib.ntu.edu.tw/handle/123456789/296936 | - |
dc.description.abstract | The growth of thin oxides by rapid thermal processing (RTP) under different O2 pressures and comparison of the uniformity of oxides by two-step oxidation and by typical one-step oxidation was presented. The process indicated that as oxidation time increases high pressure tends to make oxide thickness less uniform. The results showed that oxide thickness uniformity exhibits a 'self-compensating' behavior in low pressure oxidation, and tends to degrade with oxidation under high pressure oxidation. | - |
dc.language | en | en |
dc.relation.ispartof | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films | en_US |
dc.source | AH | - |
dc.subject.other | Dielectric materials; Electric breakdown; Film growth; Gates (transistor); Pressure effects; Rapid thermal annealing; Rate constants; Thermooxidation; Thin oxides; Thin films | - |
dc.title | Improvement of oxide thickness uniformity by high then low O2 pressure oxidation in rapid thermal processing | - |
dc.type | journal article | en |
dc.identifier.doi | 10.1116/1.1453455 | - |
dc.identifier.scopus | 2-s2.0-0036494479 | - |
dc.relation.pages | 544-548 | - |
dc.relation.journalvolume | 20 | - |
dc.relation.journalissue | 2 | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | journal article | - |
item.grantfulltext | none | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
crisitem.author.dept | Electrical Engineering | - |
crisitem.author.dept | Electronics Engineering | - |
crisitem.author.orcid | 0000-0001-9688-0812 | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 電機工程學系 |
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