https://scholars.lib.ntu.edu.tw/handle/123456789/296944| Title: | Application of irradiation-then-anneal treatment on the improvement of oxide properties in metal-oxide-semiconductor capacitors | Authors: | Lin, Jin-Jenn Hwu, Jenn-Gwo JENN-GWO HWU |
Issue Date: | 1992 | Journal Volume: | 31 | Journal Issue: | 5 A | Start page/Pages: | 1290-1297 | Source: | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0026866961&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/296944 |
DOI: | 10.1143/JJAP.31.1290 |
| Appears in Collections: | 電機工程學系 |
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