https://scholars.lib.ntu.edu.tw/handle/123456789/301811| Title: | Using anodization to oxidize ultrathin aluminum film for high-k gate dielectric application | Authors: | JENN-GWO HWU | Issue Date: | 2003 | Journal Volume: | 150 | Journal Issue: | 7 | Source: | Journal of the Electrochemical Society | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0038783313&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/301811 |
DOI: | 10.1149/1.1577545 |
| Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.