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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Evolution of Nanocrystalline Silicon Layers Deposited at 150°C for Thin Film Transistor Channels
Details
Evolution of Nanocrystalline Silicon Layers Deposited at 150°C for Thin Film Transistor Channels
Journal
Materials Research Society Symposium - Proceedings
Journal Volume
769
Pages
171-176
Date Issued
2003
Author(s)
I-CHUN CHENG
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-1542544679&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/303209
Type
conference paper