https://scholars.lib.ntu.edu.tw/handle/123456789/310755
標題: | Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies | 作者: | W. C. Cheng F. D. Lai H. M. Huang LON A. WANG |
公開日期: | 六月-2004 | 卷: | 73-74 | 起(迄)頁: | 59-62 | 來源出版物: | Microelectronic Engineering | 會議論文: | Micro and Nano Engineering 2003 | 摘要: | We report a novel tri-layer bottom antireflective coating (BARC) design based on hexamethyldisiloxane (HMDSO) films working simultaneously at 157, 193 and 248 nm wavelengths. The required optical constant for each layer can be tuned by varying the gas flow rate ratio of oxygen to HMDSO in an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) process. The swing effect in the resist is experimentally shown to be reduced significantly by adding this tri-layer BARC structure. © 2004 Elsevier B.V. All rights reserved. |
URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/310755 https://www.scopus.com/inward/record.uri?eid=2-s2.0-18544403363&doi=10.1016%2fS0167-9317%2804%2900073-5&partnerID=40&md5=a84695220a1dff4f8072d2a88b8db28d |
ISSN: | 01679317 | DOI: | 10.1016/j.mee.2004.02.016 | SDG/關鍵字: | Computational methods; Computer simulation; Cyclotron resonance; Excimer lasers; Matrix algebra; Plasma enhanced chemical vapor deposition; Problem solving; Reflection; Reflective coatings; Silicon; Substrates; Thin films; Ultraviolet radiation; Bottom antireflective coating (BARC); Flow rates; Hexamethyldisiloxane (HMDSO); Tunability; Photolithography |
顯示於: | 光電工程學研究所 |
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