https://scholars.lib.ntu.edu.tw/handle/123456789/321871| Title: | Improvement in electrical characteristics of high- k Al2O 3 gate dielectric by field-assisted nitric oxidation | Authors: | Chuang, K.-C. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2006 | Journal Volume: | 89 | Journal Issue: | 23 | Source: | Applied Physics Letters | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-33845434981&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/321871 |
DOI: | 10.1063/1.2402215 |
| Appears in Collections: | 電機工程學系 |
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