Impact of strain-temperature stress on ultrathin oxide
Journal
IEEE Transactions on Electron Devices
Journal Volume
53
Journal Issue
7
Pages
1736-1737
Date Issued
2006
Author(s)
Abstract
The effects of strain-temperature stress on the interfacial characteristics of ultrathin SiO2 films on Si substrates were investigated in this brief. Both tensile and compressive strains were respectively applied on films at evaporated temperature. Quality improvement could be observed in the tensile one but degradation in another. © 2006 IEEE.
Type
journal article