https://scholars.lib.ntu.edu.tw/handle/123456789/321882| Title: | Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics | Authors: | Lee, K.-C. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 1996 | Journal Volume: | 92 | Start page/Pages: | 204-207 | Source: | Applied Surface Science | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0030562435&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/321882 |
DOI: | 10.1016/0169-4332(95)00230-8 |
| Appears in Collections: | 電機工程學系 |
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