https://scholars.lib.ntu.edu.tw/handle/123456789/321883
Title: | The effect of postoxidation cooling in oxygen on the interface property of MOS capacitors | Authors: | Hwu, J.-G. Chang, J.-J. Wang, W.-S. JENN-GWO HWU |
Issue Date: | 1986 | Journal Volume: | 60 | Journal Issue: | 2 | Start page/Pages: | 287-292 | Source: | International Journal of Electronics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0022663517&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/321883 |
DOI: | 10.1080/00207218608920785 |
Appears in Collections: | 電機工程學系 |
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