https://scholars.lib.ntu.edu.tw/handle/123456789/321883
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Hwu, J.-G. | en_US |
dc.contributor.author | Chang, J.-J. | en_US |
dc.contributor.author | Wang, W.-S. | en_US |
dc.contributor.author | JENN-GWO HWU | zz |
dc.creator | Hwu, J.-G.;Chang, J.-J.;Wang, W.-S. | - |
dc.date.accessioned | 2018-09-10T05:52:21Z | - |
dc.date.available | 2018-09-10T05:52:21Z | - |
dc.date.issued | 1986 | - |
dc.identifier.uri | http://www.scopus.com/inward/record.url?eid=2-s2.0-0022663517&partnerID=MN8TOARS | - |
dc.identifier.uri | http://scholars.lib.ntu.edu.tw/handle/123456789/321883 | - |
dc.language | en | en |
dc.relation.ispartof | International Journal of Electronics | - |
dc.source | AH | - |
dc.title | The effect of postoxidation cooling in oxygen on the interface property of MOS capacitors | - |
dc.type | journal article | en |
dc.identifier.doi | 10.1080/00207218608920785 | - |
dc.relation.pages | 287-292 | - |
dc.relation.journalvolume | 60 | - |
dc.relation.journalissue | 2 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.cerifentitytype | Publications | - |
crisitem.author.dept | Electrical Engineering | - |
crisitem.author.dept | Electronics Engineering | - |
crisitem.author.orcid | 0000-0001-9688-0812 | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 電機工程學系 |
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