https://scholars.lib.ntu.edu.tw/handle/123456789/321885| Title: | Effect of interface traps related to mobile charges on silicon n-channel metal/oxide/semiconductor field effect transistors determined by a charge-temperature technique | Authors: | Hwu, J.G. Lin, C.M. Wang, W.S. JENN-GWO HWU |
Issue Date: | 1986 | Journal Volume: | 142 | Journal Issue: | 2 | Start page/Pages: | 183-191 | Source: | Thin Solid Films | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0022775209&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/321885 |
DOI: | 10.1016/0040-6090(86)90003-9 |
| Appears in Collections: | 電機工程學系 |
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