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College of Science / 理學院
Applied Physics / 應用物理研究所
Structure, composition and order at interfaces of crystalline oxides and other high-K materials on silicon
Details
Structure, composition and order at interfaces of crystalline oxides and other high-K materials on silicon
Journal
Defects in High-k Gate Dielectric Stacks
Pages
349-360
Date Issued
2006
Author(s)
GUSTAFSSON, TORGNY
MINGHWEI HONG et al.
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/323220
Type
book part