https://scholars.lib.ntu.edu.tw/handle/123456789/323857
Title: | Use of Si O 2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch | Authors: | Liang, E.-Z. Huang, C.-J. Lin, C.-F. CHING-FUH LIN |
Issue Date: | 2006 | Journal Volume: | 24 | Journal Issue: | 2 | Start page/Pages: | 599-603 | Source: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-33645519575&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/323857 |
DOI: | 10.1116/1.2172251 |
Appears in Collections: | 電機工程學系 |
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