https://scholars.lib.ntu.edu.tw/handle/123456789/329948| Title: | Preparation of low-temperature fluorinated oxides by anodic oxidation in dilute hydrofluosilicic acid (H2SiF6) solution | Authors: | JENN-GWO HWU | Issue Date: | 1997 | Journal Volume: | 15 | Journal Issue: | 2 | Start page/Pages: | 369-373 | Source: | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0031496818&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/329948 |
DOI: | 10.1116/1.580493 |
| Appears in Collections: | 電機工程學系 |
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