https://scholars.lib.ntu.edu.tw/handle/123456789/338631| Title: | Rapid thermal postoxidation anneal engineering in thin gate oxides with al gates | Authors: | Chen, C.-Y. Jeng, M.-J. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 1998 | Journal Volume: | 45 | Journal Issue: | 1 | Start page/Pages: | 247-253 | Source: | IEEE Transactions on Electron Devices | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0031647284&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/338631 |
DOI: | 10.1109/16.658838 |
| Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.