https://scholars.lib.ntu.edu.tw/handle/123456789/340141
Title: | Si metal-oxide-semiconductor devices with high kappa HfO2 fabricated using a novel MBE template approach followed by atomic layer deposition | Authors: | Pan, CH Kwo, J Lee, KY Lee, WC Chu, LK Huang, ML Lee, YJ MINGHWEI HONG |
Issue Date: | 2008 | Journal Volume: | 26 | Journal Issue: | 3 | Start page/Pages: | 1178-1181 | Source: | Journal of Vacuum Science & Technology B | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/340141 |
Appears in Collections: | 應用物理研究所 |
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