Temperature and active layer thickness dependent stability of on-plastic a-Si:H thin film transistors fabricated at 150°C

Please use this identifier to cite or link to this item: https://scholars.lib.ntu.edu.tw/handle/123456789/340864

Title:	Temperature and active layer thickness dependent stability of on-plastic a-Si:H thin film transistors fabricated at 150°C
Authors:	Chen, J.-Z. Cheng, I.-C. I-CHUN CHENG
Issue Date:	2008
Start page/Pages:	725-726
Source:	2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
URI:	http://www.scopus.com/inward/record.url?eid=2-s2.0-69949153093&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/340864
Appears in Collections:	光電工程學研究所

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