https://scholars.lib.ntu.edu.tw/handle/123456789/346803
Title: | Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition | Authors: | Chen, K.H. Wu, J.-J. Wen, C.Y. Chen, L.C. Fan, C.W. Kuo, P.F. Chen, Y.F. Huang, Y.S. YANG-FANG CHEN |
Issue Date: | 1999 | Journal Volume: | 355 | Start page/Pages: | 205-209 | Source: | Thin Solid Films | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0033310860&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/346803 |
DOI: | 10.1016/S0040-6090(99)00486-1 |
Appears in Collections: | 物理學系 |
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