https://scholars.lib.ntu.edu.tw/handle/123456789/347694
Title: | Trapping characteristics of Al2O3/HfO 2/SiO1-2 stack structure prepared by low temperature in situ oxidation in dc sputtering | Authors: | Chang, C.-H. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2009 | Journal Volume: | 105 | Journal Issue: | 9 | Source: | Journal of Applied Physics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-67249095674&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/347694 |
DOI: | 10.1063/1.3120942 |
Appears in Collections: | 電機工程學系 |
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