https://scholars.lib.ntu.edu.tw/handle/123456789/347698| Title: | Effect of tensile stress on mos capacitors with ultra-thin gate oxide | Authors: | Chen, H.-L. Lee, C.-J. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2009 | Journal Volume: | 16 | Journal Issue: | 4 | Start page/Pages: | 283-287 | Source: | International Journal of Electrical Engineering | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-70349616711&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/347698 |
| Appears in Collections: | 電機工程學系 |
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