https://scholars.lib.ntu.edu.tw/handle/123456789/347702| Title: | Characterization of stacked hafnium oxide (HfO2) / silicon dioxide (SiO2) metal-oxide-semiconductor (MOS) tunneling temperature sensors | Authors: | Wang, C.-Y. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2009 | Journal Volume: | 25 | Journal Issue: | 6 | Start page/Pages: | 361-370 | Source: | ECS Transactions | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-76549115571&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/347702 |
DOI: | 10.1149/1.3206635 |
| Appears in Collections: | 電機工程學系 |
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