https://scholars.lib.ntu.edu.tw/handle/123456789/347707
Title: | Fluorinated thin gate oxides prepared by room temperature deposition followed by furnace oxidation | Authors: | Yeh, K.-L. Jeng, M.-J. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 1999 | Journal Volume: | 43 | Journal Issue: | 3 | Start page/Pages: | 671-676 | Source: | Solid-State Electronics | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0033101293&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/347707 |
DOI: | 10.1016/S0038-1101(98)00284-6 |
Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.