https://scholars.lib.ntu.edu.tw/handle/123456789/347792
標題: | Liquid crystal alignment on sub-microgrooves by using oxidation nanolithography | 作者: | Lin, T.-C. CHIH-YU CHAO |
關鍵字: | Atomic force microscopy; Inorganic alignment; Liquid crystals | 公開日期: | 2009 | 卷: | 510 | 起(迄)頁: | 134-140 | 來源出版物: | Molecular Crystals and Liquid Crystals | 摘要: | Conductive atomic force microscopy (CAFM) nanolithography was utilized to modify a silicon surface. With this method generating the silicon oxide relief by CAFM, liquid crystal (LC) alignment is under a good control in the micron or submicron region. It establishes high-resolution images with a pixel of a smaller size. Compared with the conventional cloth rubbing and AFM scratching techniques, the CAFM nanolithography prevents scratching damage, dust contamination and residual static electricity problems. Furthermore, this inorganic alignment method can also avoid the damage from UV light exposure and high-temperature environment. |
URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-70349585902&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/347792 |
ISSN: | 15421406 | DOI: | 10.1080/15421400903060540 | SDG/關鍵字: | Atomic force microscopy; Chromium compounds; Nanolithography; Silicon compounds; Silicon oxides; Conductive atomic force microscopy; Dust contamination; High resolution image; High-temperature environment; Inorganic alignment; Liquid crystal alignment; Silicon surfaces; UV light exposures; Liquid crystals |
顯示於: | 應用物理研究所 |
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