Chemical-mechanical polishing of low dielectric constant poly(silsesquioxane): HSQ

Journal

Journal of Polymer Research

Journal Volume

6

Journal Issue

3

Pages

197-202

Date Issued

1999

Author(s)

Yen, C.-T.

DOI

10.1007/s10965-006-0088-x

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0033326173&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/348054

Type

journal article