https://scholars.lib.ntu.edu.tw/handle/123456789/352121| Title: | Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability | Authors: | KUEN-YU TSAI | Issue Date: | Feb-2009 | Start page/Pages: | 7271-22 | Source: | Advanced Lithography 2009 | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/352121 |
| Appears in Collections: | 電機工程學系 |
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