Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
A Novel Bottom Antireflective Coating Working for Both KrF and ArF Lithography
Details
A Novel Bottom Antireflective Coating Working for Both KrF and ArF Lithography
Journal
Micro- and Nano-Engineering
Pages
107-108
Date Issued
1999-01
Author(s)
L. A. Wang
H. L. Chen
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/352327
Type
conference paper