https://scholars.lib.ntu.edu.tw/handle/123456789/352327
Title: | A Novel Bottom Antireflective Coating Working for Both KrF and ArF Lithography | Authors: | L. A. Wang H. L. Chen LON A. WANG |
Issue Date: | Jan-1999 | Start page/Pages: | 107-108 | Source: | Micro- and Nano-Engineering | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/352327 |
Appears in Collections: | 光電工程學研究所 |
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