https://scholars.lib.ntu.edu.tw/handle/123456789/356360| Title: | Stack engineering of low-temperature-processing Al2O3 dielectrics prepared by nitric acid oxidation for MOS structure | Authors: | Chen, C.-H. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2010 | Journal Volume: | 87 | Journal Issue: | 4 | Start page/Pages: | 686-689 | Source: | Microelectronic Engineering | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-75149157459&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/356360 |
DOI: | 10.1016/j.mee.2009.09.013 |
| Appears in Collections: | 電機工程學系 |
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