https://scholars.lib.ntu.edu.tw/handle/123456789/358251
Title: | Halo profile engineering to reduce Vt fluctuation in high-K/metal-gate nMOSFET | Authors: | Chen, W.-Y. Yu, T.-H. Ohtou, T. Sheu, Y.-M. Wu, J. Liu, C. CHEE-WEE LIU |
Issue Date: | 2010 | Start page/Pages: | 145-148 | Source: | International Conference on Simulation of Semiconductor Processes and Devices, SISPAD | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-78649534792&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/358251 |
DOI: | 10.1109/SISPAD.2010.5604546 |
Appears in Collections: | 電機工程學系 |
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