https://scholars.lib.ntu.edu.tw/handle/123456789/363036| Title: | Comprehensive study on negative capacitance effect observed in MOS(n) capacitors with ultrathin gate oxides | Authors: | Chang, S.-J. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2011 | Journal Volume: | 58 | Journal Issue: | 3 | Start page/Pages: | 684-690 | Source: | IEEE Transactions on Electron Devices | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-79952036866&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/363036 |
DOI: | 10.1109/TED.2010.2102033 |
| Appears in Collections: | 電機工程學系 |
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