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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect
Details
Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect
Journal
IEEE Conference on Nanotechnology
Pages
5-8
Date Issued
2011
Author(s)
Hung, S.-C.
Shiu, S.-C.
Chao, J.-J.
CHING-FUH LIN
DOI
10.1109/NANO.2011.6144570
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-84858968032&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/364951
Type
conference paper