https://scholars.lib.ntu.edu.tw/handle/123456789/372498
標題: | Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios | 作者: | Lin, T.-C. Shiu, S.-C. Pun, K.-L. Syu, H.-J. Lin, C.-F. CHING-FUH LIN |
關鍵字: | crystalline materials; etching; nanostructuredmaterials; optical reflection; photovoltaic cells; silicon; thin film devices | 公開日期: | 2012 | 起(迄)頁: | 346-349 | 來源出版物: | IEEE Photovoltaic Specialists Conference | 摘要: | Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H2O2/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV. © 2012 IEEE. |
URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84869381652&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/372498 |
DOI: | 10.1109/PVSC.2012.6317633 | SDG/關鍵字: | Chemical solutions; Crystalline Si; Crystalline thin films; Layer transfer; Low costs; Manufacturing methods; Material utilization; Metal-assisted chemical etching; Nanoholes; Optical reflectance; Optical reflection; Photovoltaic; Efficiency; Etching; Nanostructured materials; Photovoltaic cells; Silicon; Thin film devices; Thin films; Crystalline materials |
顯示於: | 電機工程學系 |
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