https://scholars.lib.ntu.edu.tw/handle/123456789/374081
Title: | New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints | Authors: | Hoi-Tou Ng Yu-Tian Shen Sheng-Yung Chen Chun-Hung Liu Philip C. W. Ng Kuen-Yu Tsai KUEN-YU TSAI |
Issue Date: | Sep-2012 | Journal Volume: | 11 | Journal Issue: | 3 | Start page/Pages: | 033007 | Source: | Journal of Micro/Nanolithography, MEMS, and MOEMS | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/374081 | DOI: | 10.1117/1.JMM.11.3.033007 |
Appears in Collections: | 電機工程學系 |
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