https://scholars.lib.ntu.edu.tw/handle/123456789/385257| Title: | Roles of interface and oxide trap density in the kinked current behavior of Al/SiO2/Si(p) structures with ultra-thin oxides | Authors: | Lu, H.-W. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2014 | Journal Volume: | 115 | Journal Issue: | 3 | Start page/Pages: | 837-842 | Source: | Applied Physics A: Materials Science and Processing | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84901639242&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/385257 |
DOI: | 10.1007/s00339-013-7873-2 |
| Appears in Collections: | 電機工程學系 |
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