Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters
Journal
Acs Nano
Journal Volume
9
Journal Issue
11
Pages
11439-11454
Date Issued
2015
Author(s)
Cao, Huan H.
Nakatsuka, Nako
Serino,
rew C.
Cheunkar, Sarawut
Yang, Hongyan
Weiss, Paul S.
rews, Anne M.
Abstract
Nucleotide arrays require controlled surface densities and minimal nucleotide-substrate interactions to enable highly specific and efficient recognition by corresponding targets. We investigated chemical lift-off lithography with hydroxyl- and oligo(ethylene glycol)-terminated alkanethiol self-assembled monolayers as a means to produce substrates optimized for tethered DNA insertion into post-lift-off regions. Residual alkanethiols in the patterned regions after lift-off lithography enabled the formation of patterned DNA monolayers that favored hybridization with target DNA. Nucleotide densities were tunable by altering surface chemistries and alkanethiol ratios prior to lift-off. Lithography-induced conformational changes in oligo(ethylene glycol)-terminated monolayers hindered nucleotide insertion but could be used to advantage via mixed monolayers or double-lift-off lithography. Compared to thiolated DNA self-assembly alone or with alkanethiol backfilling, preparation of functional nucleotide arrays by chemical lift-off lithography enables superior hybridization efficiency and tunability.
Type
journal article