https://scholars.lib.ntu.edu.tw/handle/123456789/404528
Title: | Improved Si0.5Ge0.5/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopy | Authors: | M. H.Liao C.-H. Chen |
Issue Date: | 2013 | Journal Volume: | 3 | Journal Issue: | 4 | Start page/Pages: | 42108 | Source: | AIP Advances | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/404528 |
Appears in Collections: | 電機工程學系 |
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