|Title:||Conversion of dense and continuous nickel oxide compound thin films using nitrogen DC-pulse atmospheric-pressure plasma jet||Authors:||Tsai J.-H.
|Keywords:||Atmospheric pressure plasma jet;Liquid precursor film;Ni(OH)2;Nickel oxide;Sol gel;X-ray photoelectron spectroscopy||Issue Date:||2019||Source:||Ceramics International||Abstract:||
A nitrogen DC-pulse atmospheric-pressure plasma jet (APPJ) is used to convert spin-coated nickel acetate liquid precursor films into continuous and dense NiO compound thin films. Films calcined by APPJ for 0¡V120 s are characterized. X-ray photoelectron spectroscopy (XPS) indicates that metallic Ni content increases and then decreases as the APPJ calcination time increases. Wrinkles are formed on films with higher metallic Ni contents owing to the compressive stresses caused by the mismatch between the film and the substrate. Plasma reactive species contain electrons and ions that could cause oxidation and reduction reactions simultaneously. This leads to the complex compositions in the resultant films. The film becomes more metal-like when the metallic Ni content is high and becomes more semiconductor-like for low metallic Ni content film. Seebeck measurements confirms that all APPJ-converted NiO compound films are of p-type and could potentially be used as the hole transport layer or the hole injection layer of optoelectronic devices. ? 2019 Elsevier Ltd and Techna Group S.r.l.
|Appears in Collections:||應用力學研究所|
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