https://scholars.lib.ntu.edu.tw/handle/123456789/425295
Title: | Effect of Al/Cu ratios on the optical, electrical, and electrochemical properties of Cu-Al-Ca-O thin films | Authors: | Cheng I.-C. Chang S.-H. Lin G.-W. Chi C.-T. Hsiao S.-H. JIAN-ZHANG CHEN I-CHUN CHENG |
Keywords: | Cu-Al-Ca-O thin films;Electrical property;Electrochemical property;Heterojunction diode;Transparent conducting oxide | Issue Date: | 2014 | Journal Volume: | 609 | Start page/Pages: | 111-115 | Source: | Journal of Alloys and Compounds | Abstract: | This study systematically investigated the effect of various Al/Cu ratios on the optical, electrical, and electrochemical properties of sputter-deposited CuAlx-0.2Ca0.2O (x = 1, 1.25, 1.5, 1.75, 2) thin films. The as-sputtered Cu-Al-Ca-O films were all amorphous regardless of Al/Cu ratio. Both the transmittance and resistivity of the Cu-Al-Ca-O films increased with increasing Al/Cu ratios. Heterojunction diodes fabricated using Al-doped ZnO, ZnO, and Cu-Al-Ca-O thin films of various Al/Cu ratios exhibited high breakdown-voltage values when Cu-Al-Ca-O thin films with high Al/Cu ratios. Optimal rectification ratio and electrical properties were determined in diodes that had CuAl1.3Ca0.2O as their p-layer deposited film. Cu-Al-Ca-O films with high Al/Cu ratios exhibited low average corrosion current density (icorr) values and high breakdown-voltages (Ebr) values, indicating that the corrosion resistance of Cu-Al-Ca-O film increases with increasing Al/Cu ratios. ? 2014 Elsevier B.V. All rights reserved. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/425295 | ISSN: | 09258388 | DOI: | 10.1016/j.jallcom.2014.04.146 |
Appears in Collections: | 應用力學研究所 |
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